Nikon’s New S3S LAB: A Hub for Flexible Electronics Innovation
In an exciting development for the technology sector, Nikon Corporation is set to unveil its state-of-the-art co-creation platform, "S3S LAB," on December 10, 2025. This advanced laboratory will be located within Nikon’s Sagamihara Plant in Kanagawa prefecture, Japan, and will serve as a pivotal center for the development of flexible electronics. The lab is designed to house Nikon’s proprietary Roll-to-Roll (R2R) maskless lithography system along with a suite of peripheral equipment essential for film deposition and multilayer wiring formation. This innovation hub aims to provide comprehensive solutions to the challenges faced by customers, spanning from research and development to eventual commercialization.
Flexible electronics represent a significant advancement in technology, allowing electronic circuits to be created on flexible film surfaces. This breakthrough enables the creation of lightweight, thin, and transparent devices that can be shaped freely. The potential applications for these innovations are vast, spanning fields like displays, sensors, and even perovskite solar cells. Despite the promising future of flexible electronics, transitioning from research and development to mass production remains a significant hurdle. The process requires substantial capital investment, and globally, there are few platforms equipped to consistently verify the R2R process.
"S3S LAB" aims to bridge this gap by offering integrated support, from prototype creation to the development of mass production processes. This will enable customers to conduct necessary process verifications for mass production and make informed commercialization decisions without incurring large-scale capital investments. During the mass production phase, Nikon will leverage the technology and equipment developed at "S3S LAB" to assist customers in bringing their products to market, thus ushering in a new era in the flexible electronics industry.
What is Roll-to-Roll (R2R) Processing?
Roll-to-Roll processing is a manufacturing technique where roll-shaped substrates are continuously processed and then rewound into rolls. This method offers superior continuity and productivity compared to traditional sheet processing. The R2R process is crucial for the production of flexible electronics, as it enables the efficient creation of circuits on flexible film surfaces.
Overview of S3S LAB
Location
10-1, Asamizodai 1-chome, Minami-ku, Sagamihara, Kanagawa, Japan (within Nikon Sagamihara Plant)
Main Services
- Prototype manufacturing
- Total solutions including mass production process development
Operation Start Date
December 10, 2025Main Equipment
- R2R Maskless Lithography System
- Cleaning System
- Slit Die Coating System
- HMDS Coating System
- Thermal Annealing System
- Developing System
- Etching System
- Peeling System
- Optical Inspection System
- Laminating System
- CVD/RIE System
- Vacuum Sputtering System
- Mist Coating System
- Vacuum Vapor Deposition System
Usage
Advance reservations requiredFeatures of the R2R Maskless Lithography System
The R2R Maskless Lithography System boasts several key features that enhance its utility in flexible electronics manufacturing:
- High Resolution and Accuracy: It achieves a resolution of 6.0 micrometers (µm) for line and space (L/S) and overlay accuracy within ± 2 µm. This precision is essential for films that are prone to deformation, such as those that distort or shrink due to heat, making it ideal for producing high-definition and multilayer wiring devices.
- Enhanced Productivity: The system delivers high productivity, processing at a speed of 10 millimeters per second. This efficiency is achieved through multi-lens technology, a development from Nikon’s flat panel display (FPD) lithography systems.
- Advanced Patterning Method: The system uses a polygon scanning method to pattern on the curved surface of the roll, which enables continuous patterning.
- No Photomask Required: Since exposure is based on computer-aided design (CAD) data, no photomask is needed. This approach significantly shortens the time required for prototyping and reduces the costs associated with mask production.
Technical Terms Explained
Micrometer (µm): A micrometer is a unit of length equal to one-millionth of a meter, or one-thousandth of a millimeter. It is commonly used to measure small distances in the fields of science and engineering.
Line and Space (L/S): This term refers to the width of a wire in an electronic circuit and the spacing between adjacent wires. It is a critical measurement in the design and production of electronic circuits.
Multi-Lens Technology: Nikon’s proprietary technology for FPD lithography systems, this method arranges multiple projection lenses in an array. These lenses are precisely controlled to achieve the same effect as using a single large lens, allowing for patterning over a wider area in a single scan.
Overview of the R2R Maskless Lithography System
Product Name
Roll to Roll Maskless Lithography SystemResolution
6.0 µm L/SLight Source
i-line equivalentOverlay Accuracy
≤± 2 µmSupported Film Width
400 mm or less (other sizes available upon request)Throughput
10 mm/sec (with a dose of 100 mJ/cm² and resist film thickness of 1.4 µm)Conclusion
The opening of Nikon’s "S3S LAB" marks a significant milestone in the flexible electronics industry. By providing a space equipped with the latest technology for prototype manufacturing and mass production process development, Nikon is poised to play a central role in advancing this field. The lab’s cutting-edge R2R maskless lithography system, along with its suite of supporting equipment, will offer customers the tools they need to overcome the challenges of transitioning from research and development to commercialization. This initiative not only highlights Nikon’s commitment to innovation but also promises to drive progress and open new possibilities in the world of flexible electronics.
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